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Plasma-Ätzanlage - PR1241915-2270-W

At a glance

Fraunhofer-Gesellschaft, Einkauf B12 is procuring Semiconductors (CPV 31712330) in München, Landkreis (DE21H). It has been awarded. Procedure type: Negotiated without prior call for competition.

From the notice

Plasma-Ätzanlage

Key facts

Each fact is from the official notice, last checked 7 November 2026, 12:30 (UTC+01:00).

Status
AwardedOfficial notice · checked 7 Nov 2026, 12:30 (UTC+01:00)
Deadline
No deadline in the noticeOfficial notice · checked 7 Nov 2026, 12:30 (UTC+01:00)
Buyer
Fraunhofer-Gesellschaft, Einkauf B12, München, DEOfficial notice · checked 7 Nov 2026, 12:30 (UTC+01:00)
Place of performance
München, Landkreis (DE21H)Official notice · checked 7 Nov 2026, 12:30 (UTC+01:00)
Main CPV
Semiconductors (CPV 31712330)Official notice · checked 7 Nov 2026, 12:30 (UTC+01:00)
Procedure
Negotiated without prior call for competitionOfficial notice · checked 7 Nov 2026, 12:30 (UTC+01:00)
Lots
1Official notice · checked 7 Nov 2026, 12:30 (UTC+01:00)
First published
17 September 2026, 09:08 (UTC+02:00)Official notice · checked 7 Nov 2026, 12:30 (UTC+01:00)

Fact sheet

Inteliwert fact sheet: Plasma-Ätzanlage - PR1241915-2270-W — Fraunhofer-Gesellschaft, Einkauf B12. A product of Bandpey GmbH.
The key facts of this page as an image (PNG, 1600 × 900), made from the official notice. © Bandpey GmbH; terms of use. Download the fact sheet

Lots (1)

  1. Lot LOT-0000: Plasma-Ätzanlage - PR1241915-2270-W

    Many areas of semiconductors, MEMS, and 3D integration technologies - such as microfluidics, physical, optical, and chemical sensors, and emerging quantum mechanical devices such as so-called Qubits and their integration into silicon substrates - utilize the excellent properties of silicon. In particular, high-precision structuring methods have been developed for these applications. Micro- and nanochannels, membranes, valves, cantilevers, and through-silicon vias are manufactured using Si deep reactive ion etching (Si-DRIE) technology. As a standard etching gas, SF6 is employed in Silicon Deep Reactive Ion Etching (Si-DRIE) processes. SF6 is a potent greenhouse gas with a high global warming potential (GWP) of 25.300 CO2-equivalents. Although the semiconductor industry currently benefits from an exemption regarding SF6 usage, the duration of this exemption remains uncertain. Consequently, the identification of alternative gases to replace SF6 is becoming more important. One promising alternative is F2 gas mixtures. However, their implementation requires specialized modifications to both gas infrastructure and process kits. Hence, in addition to its fluorine compatibility, the requirements for the novel etching system should include scalability and a minimized process chamber volume compared to conventional plasma etching systems. This reduction in chamber volume decreases the total gas flow required, thereby enabling nearly complete gas utilization while minimizing gas-wall interactions. Consequently, faster gas switching times can be achieved in Bosch processes. A key feature of this new developed etching system is its "Green Production" concept, which focuses on the minimization and prevention of environmentally harmful gases. Furthermore, the system enables straightforward scaling of substrate sizes from 150 mm to 200 mm.

    CPV
    Semiconductors (CPV 31712330)
    Place
    München, Landkreis (DE21H)

Timeline

  1. 15 September 2026: Award. Winner: HQ-Dielectrics GmbH; Tenders received: 1; Lot LOT-0000.
  2. 17 September 2026, 09:08 (UTC+02:00): Award notice Notice, version 01 (Contract or concession award notice – standard regime). Official notice

Buyer and place

Buyer

Fraunhofer-Gesellschaft, Einkauf B12
München, DE

Place of performance

  • München, Landkreis (DE21H)

Other parties in the notice

  • HQ-Dielectrics GmbH (Tenderer), Dornstadt
  • HQ-Dielectrics GmbH (Winner), Dornstadt

Classification

CPV codes

  • 31712330: Semiconductors

NUTS regions

  • DE21H: München, Landkreis

Official documents

No documents found in the indexed notice.

Questions and answers

Who is the buyer?

Fraunhofer-Gesellschaft, Einkauf B12, München, DE.

What is being procured (CPV)?

Semiconductors (CPV 31712330).

Where is the work performed (NUTS)?

München, Landkreis (DE21H).

Is it divided into lots?

No, the notice names a single lot.

Which procedure is used?

Negotiated without prior call for competition.

How do I submit a bid?

On the official notice or the portal it names. Inteliwert does not submit bids. Official notice

Am I eligible?

Inteliwert does not judge eligibility. The selection criteria are in the official notice. Official notice

More from this buyer

Other published opportunities of this buyer in the indexed notices, open ones first.

Source

Publisher
Bekanntmachungsservice
Licence
CC0 1.0
Last checked
7 November 2026, 12:30 (UTC+01:00)

The official notice is authoritative. Inteliwert shows what the notice states and links to it.

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